We provide industry leading EUVL light sources to optimize semiconductor lithography processes.
더 보기We enhance the efficiency and quality of semiconductor manufacturing through next-generation EUVL materials and components
더 보기We provide EUVL pellicle transmittance, nanopatterning evaluation equipment, and analysis services for EUVL optical components and materials. ● EUVL pellicle transmittance measurement equipment ● EUVL mask reflectivity measurement equipment ● Hydrogen, high-temperature, and lifetime evaluation of EUVL optical components and materials etc.
EUV light source technology necessitates an Ultra-High Vacuum (UHV) environment. Leveraging our expertise, we design, manufacture, and supply UHV components, providing comprehensive professional support for entire vacuum systems
더 보기World-class EUVL or The next generation Blue-X after EUVL light source technology, Holding numerous related patents, Forming diverse networks through beam line operation and joint research
Light source itself is a product, Utilized in various versions of measurement devices, Applied to the development of EUVL-related materials and components
Extensive research achievements accumulated in the field of EUV lithography (EUVL), Extensive experience and know-how accumulated in the EUVL technology domain.
Securing core technologies and leading EUVL or Blue-X technology
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