We provide industry leading EUVL light sources to optimize semiconductor lithography processes.
더 보기We enhance the efficiency and quality of semiconductor manufacturing through next-generation EUVL materials and components
더 보기We provide EUVL pellicle transmittance, nanopatterning evaluation equipment, and analysis services for EUVL optical components and materials. ● EUVL pellicle transmittance measurement equipment ● EUVL mask reflectivity measurement equipment ● Hydrogen, high-temperature, and lifetime evaluation of EUVL optical components and materials etc.
EUV light source technology requires an Ultra-High Vacuum (UHV) system. Therefore, in addition to our light source technology, we are capable of ordering and manufacturing UHV components, supplying ion pumps, and providing professional support and assistance for overall vacuum systems.
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