We provide industry leading EUVL light sources to optimize semiconductor lithography processes.
더 보기We enhance the efficiency and quality of semiconductor manufacturing through next-generation EUVL materials and components
더 보기We provide EUVL pellicle transmittance, nanopatterning evaluation equipment, and analysis services for EUVL optical components and materials. ● EUVL pellicle transmittance measurement equipment ● EUVL mask reflectivity measurement equipment ● Hydrogen, high-temperature, and lifetime evaluation of EUVL optical components and materials etc.
EUV light source technology requires an Ultra-High Vacuum (UHV) system. Therefore, in addition to our light source technology, we are capable of ordering and manufacturing UHV components, supplying ion pumps, and providing professional support and assistance for overall vacuum systems.
더 보기World-class EUVL or The next generation Blue-X after EUVL light source technology, Holding numerous related patents, Forming diverse networks through beam line operation and joint research
Light source itself is a product, Utilized in various versions of measurement devices, Applied to the development of EUVL-related materials and components
Extensive research achievements accumulated in the field of EUV lithography (EUVL), Extensive experience and know-how accumulated in the EUVL technology domain.
Securing core technologies and leading EUVL or Blue-X technology
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